Original Reports
ZHANG Yong-mei, WANG Shu, HU Xiao-hui, ZHAO Yang, GE Lei, BO Li-chao
Objective To investigate the resistance level of Culex pipiens pallens to commonly used insecticides in Tianjin,China, to analyze its changing trend, and to provide scientific and rational guidance for the chemical control. Methods The larvae of Cx. pipiens pallens were collected in 2013, 2016, and 2019. The first generation was fed in the laboratory. The late third-instar or early forth-instar larvae were then selected as test subjects, and the larval dipping method was used to measure their insecticide resistance. Results In 2013, 2016, and 2019, the Cx. pipiens pallens at various surveillance sites in Tianjin all showed varying degrees of resistance to beta-cypermethrin, deltamethrin, and temephos. In different years, Cx. pipiens pallens at various surveillance sites all showed medium or low resistance to beta-cypermethrin; Cx. pipiens pallens in Hebei district had the highest resistance in the whole city, with a resistance ratio of 20.94. Culex pipiens pallens showed high, medium, or low resistance to deltamethrin and temephos; Cx. pipiens pallens in Hedong district had the highest resistance to deltamethrin, with a resistance ratio of 69.78; Cx. pipiens pallens in Beichen district had the highest resistance to temephos, with a resistance ratio of 57.14. The resistance levels of Cx. pipiens pallens to the three insecticides showed overall upward trends from 2013 to 2016, and then the number of districts resistant to beta-cypermethrin and temephos decreased from 7 in 2016 to 5 and 6 in 2019, respectively, while the number of districts resistant to deltamethrin did not change. Conclusion In Tianjin, Cx. pipiens pallens has developed resistance to all of beta-cypermethrin, deltamethrin,and temephos. It is recommended that insecticides should be used scientifically and reasonably based on the surveillance results of insecticide resistance. At the same time, a rotation and mixed use of insecticides should be adopted to delay the development of resistance.